Moxtek designs and manufactures high-performance visible polarizers engineered to deliver reliable polarization control across a broad spectral range. Their products are trusted in projection, imaging, display, and analytical systems where precision, durability, and optical quality are critical.
Moxtek’s ProFlux® reflective wire-grid polarizers are designed for demanding optical systems that require high transmission, contrast, and wide angular performance. Constructed using advanced nano-imprint lithography on durable glass substrates, these polarizers feature aluminum nanowires that efficiently separate polarization states over a broad range of wavelengths.
Key advantages include:
These polarizers are commonly used in projection displays, heads-up displays (HUD), and scientific instrumentation where reflective configurations are preferred.
Moxtek also offers visible absorptive polarizers that provide excellent polarization uniformity and low reflectivity in compact optical systems. Unlike reflective types, these polarizers absorb the unwanted polarization component, reducing stray light and improving image contrast.
Key characteristics:
They are ideal for imaging, microscopy, and display applications where transmitted light quality and system compactness are priorities.
Together, Moxtek’s reflective and absorptive polarizers cover a wide range of optical design needs - from high-brightness projection and AR/VR optics to precision instrumentation and machine vision. With a commitment to performance consistency and manufacturing excellence, Moxtek provides robust and innovative solutions for visible light polarization in both reflective and transmissive configurations.
Moxtek’s ProFlux® reflective wire-grid polarizers are designed for demanding optical systems that require high transmission, contrast, and wide angular performance. Constructed using advanced nano-imprint lithography on durable glass substrates, these polarizers feature aluminum nanowires that efficiently separate polarization states over a broad range of wavelengths.
Key advantages include:
These polarizers are commonly used in projection displays, heads-up displays (HUD), and scientific instrumentation where reflective configurations are preferred.
Moxtek also offers visible absorptive polarizers that provide excellent polarization uniformity and low reflectivity in compact optical systems. Unlike reflective types, these polarizers absorb the unwanted polarization component, reducing stray light and improving image contrast.
Key characteristics:
They are ideal for imaging, microscopy, and display applications where transmitted light quality and system compactness are priorities.
Together, Moxtek’s reflective and absorptive polarizers cover a wide range of optical design needs - from high-brightness projection and AR/VR optics to precision instrumentation and machine vision. With a commitment to performance consistency and manufacturing excellence, Moxtek provides robust and innovative solutions for visible light polarization in both reflective and transmissive configurations.
Moxtek’s ProFlux® reflective wire-grid polarizers are designed for demanding optical systems that require high transmission, contrast, and wide angular performance. Constructed using advanced nano-imprint lithography on durable glass substrates, these polarizers feature aluminum nanowires that efficiently separate polarization states over a broad range of wavelengths.
Key advantages include:
These polarizers are commonly used in projection displays, heads-up displays (HUD), and scientific instrumentation where reflective configurations are preferred.
Moxtek also offers visible absorptive polarizers that provide excellent polarization uniformity and low reflectivity in compact optical systems. Unlike reflective types, these polarizers absorb the unwanted polarization component, reducing stray light and improving image contrast.
Key characteristics:
They are ideal for imaging, microscopy, and display applications where transmitted light quality and system compactness are priorities.
Together, Moxtek’s reflective and absorptive polarizers cover a wide range of optical design needs - from high-brightness projection and AR/VR optics to precision instrumentation and machine vision. With a commitment to performance consistency and manufacturing excellence, Moxtek provides robust and innovative solutions for visible light polarization in both reflective and transmissive configurations.
Moxtek collaborates with customers to design, verify, and create solutions for high-volume manufacturing. They provide options for prompt design iterations and NanoImprint Lithography (NIL) optimization. Moxtek uses Statistical Process Control (SPC) monitoring of post-print Critical Dimension (CD) repeatability.
Moxtek offers prototyping samples through their recurring Design Master Shuttle. This NIL Design Master Shuttle includes space for multiple (different) design structures, allowing engineers to test several designs on a single shuttle iteration, thereby reducing development time and cost. They can add a customer’s unique design to their next Design Master Shuttle for prototyping the latest lens or nanostructure optical device. These design shuttles are processed multiple times each year.
Moxtek has been producing nanostructured optical components for over 20 years. They offer high-volume wafer replication of nanostructure devices on Ø200 mm wafers. Their versatile capabilities are used to manufacture functional metasurfaces, including metalenses, meta-optical elements (MOE), diffractive optical elements (DOE), patterned nanostructures, waveguides, photonic crystals, and biosensor arrays. These devices are used in imaging, illumination, and display systems for a wide range of applications, including automotive, medical and dental imaging, camera systems, and many others.
Moxtek collaborates with customers to design, verify, and create solutions for high-volume manufacturing. They provide options for prompt design iterations and NanoImprint Lithography (NIL) optimization. Moxtek uses Statistical Process Control (SPC) monitoring of post-print Critical Dimension (CD) repeatability.
Moxtek offers prototyping samples through their recurring Design Master Shuttle. This NIL Design Master Shuttle includes space for multiple (different) design structures, allowing engineers to test several designs on a single shuttle iteration, thereby reducing development time and cost. They can add a customer’s unique design to their next Design Master Shuttle for prototyping the latest lens or nanostructure optical device. These design shuttles are processed multiple times each year.
Moxtek has been producing nanostructured optical components for over 20 years. They offer high-volume wafer replication of nanostructure devices on Ø200 mm wafers. Their versatile capabilities are used to manufacture functional metasurfaces, including metalenses, meta-optical elements (MOE), diffractive optical elements (DOE), patterned nanostructures, waveguides, photonic crystals, and biosensor arrays. These devices are used in imaging, illumination, and display systems for a wide range of applications, including automotive, medical and dental imaging, camera systems, and many others.
Moxtek collaborates with customers to design, verify, and create solutions for high-volume manufacturing. They provide options for prompt design iterations and NanoImprint Lithography (NIL) optimization. Moxtek uses Statistical Process Control (SPC) monitoring of post-print Critical Dimension (CD) repeatability.
Moxtek offers prototyping samples through their recurring Design Master Shuttle. This NIL Design Master Shuttle includes space for multiple (different) design structures, allowing engineers to test several designs on a single shuttle iteration, thereby reducing development time and cost. They can add a customer’s unique design to their next Design Master Shuttle for prototyping the latest lens or nanostructure optical device. These design shuttles are processed multiple times each year.
Moxtek has been producing nanostructured optical components for over 20 years. They offer high-volume wafer replication of nanostructure devices on Ø200 mm wafers. Their versatile capabilities are used to manufacture functional metasurfaces, including metalenses, meta-optical elements (MOE), diffractive optical elements (DOE), patterned nanostructures, waveguides, photonic crystals, and biosensor arrays. These devices are used in imaging, illumination, and display systems for a wide range of applications, including automotive, medical and dental imaging, camera systems, and many others.
Moxtek wire grid polarizers provide exceptional optical performance across a wide range of conditions.
Moxtek wire grid polarizers provide exceptional optical performance across a wide range of conditions.
Moxtek wire grid polarizers provide exceptional optical performance across a wide range of conditions.
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