Pixelated Polarizers

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Why use a pixelated polarizer?

• Real-time polarimetry: Traditional polarimetric imaging often requires taking multiple images at different polarizer angles (or uses multiple cameras) and then aligning/overlaying them. With Moxtek’s pixelated array, all polarization states are captured simultaneously, enabling much faster acquisition and avoiding registration errors.
• Higher contrast & richer image information: Polarization provides additional image contrast beyond intensity or color alone—helping highlight surface features (shape, texture, roughness), material differences, and features obscured by low light or glare.
• Broad spectral & angular performance: These polarizers support visible through infrared wavelengths, and maintain performance (e.g., without depolarization) for ±20° angle of incidence.
• Customisable geometry for sensor integration: Pixel pitch, number of polarization states (2/3/4), substrate materials, and mounting options can all be tailored to match specific camera sensor arrays and form factors.

• Robust inorganic construction: Using inorganic (wire-grid) technology improves thermal stability, durability (versus organic film or polymer polarizers), and enables use in demanding environments (e.g., high photon flux, IR imaging) where other polarizers might fail.

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Typical applications

• Imaging polarimetry and polarization difference imaging
• 3D imaging and depth sensing (via polarization-enhanced cues)
• Machine vision and industrial inspection in challenging light/contrast conditions
• Biometric facial recognition (where polarization can highlight surface features)
• Remote sensing, surveillance, target discrimination
• Interferometry and polarization-based measurement systems

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Key specification highlights

• Pixel pitch: standard options from ~5.5 µm up to ~30 µm, with custom sizes available.
• Transmission: > 80% at 632 nm (at pixel centre) typical for visible versions.
• Contrast ratio: > 200:1 at 632 nm at pixel centre typical.
• Wavelength range: visible (400-700 nm) standard; IR options (e.g., 3-5 µm, 8-12 µm) available on request.
• Thermal endurance: substrates rated up to about 200 °C (for visible-coated versions) for >5,000 hours in many cases.

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‍

‍

Why use a pixelated polarizer?

• Real-time polarimetry: Traditional polarimetric imaging often requires taking multiple images at different polarizer angles (or uses multiple cameras) and then aligning/overlaying them. With Moxtek’s pixelated array, all polarization states are captured simultaneously, enabling much faster acquisition and avoiding registration errors.
• Higher contrast & richer image information: Polarization provides additional image contrast beyond intensity or color alone—helping highlight surface features (shape, texture, roughness), material differences, and features obscured by low light or glare.
• Broad spectral & angular performance: These polarizers support visible through infrared wavelengths, and maintain performance (e.g., without depolarization) for ±20° angle of incidence.
• Customisable geometry for sensor integration: Pixel pitch, number of polarization states (2/3/4), substrate materials, and mounting options can all be tailored to match specific camera sensor arrays and form factors.

• Robust inorganic construction: Using inorganic (wire-grid) technology improves thermal stability, durability (versus organic film or polymer polarizers), and enables use in demanding environments (e.g., high photon flux, IR imaging) where other polarizers might fail.

‍

Typical applications

• Imaging polarimetry and polarization difference imaging
• 3D imaging and depth sensing (via polarization-enhanced cues)
• Machine vision and industrial inspection in challenging light/contrast conditions
• Biometric facial recognition (where polarization can highlight surface features)
• Remote sensing, surveillance, target discrimination
• Interferometry and polarization-based measurement systems

‍

Key specification highlights

• Pixel pitch: standard options from ~5.5 µm up to ~30 µm, with custom sizes available.
• Transmission: > 80% at 632 nm (at pixel centre) typical for visible versions.
• Contrast ratio: > 200:1 at 632 nm at pixel centre typical.
• Wavelength range: visible (400-700 nm) standard; IR options (e.g., 3-5 µm, 8-12 µm) available on request.
• Thermal endurance: substrates rated up to about 200 °C (for visible-coated versions) for >5,000 hours in many cases.

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Foundry Services

Moxtek collaborates with customers to design, verify, and create solutions for high-volume manufacturing. They provide options for prompt design iterations and NanoImprint Lithography (NIL) optimization. Moxtek uses Statistical Process Control (SPC) monitoring of post-print Critical Dimension (CD) repeatability.

Moxtek offers prototyping samples through their recurring Design Master Shuttle. This NIL Design Master Shuttle includes space for multiple (different) design structures, allowing engineers to test several designs on a single shuttle iteration, thereby reducing development time and cost. They can add a customer’s unique design to their next Design Master Shuttle for prototyping the latest lens or nanostructure optical device. These design shuttles are processed multiple times each year.

Moxtek has been producing nanostructured optical components for over 20 years. They offer high-volume wafer replication of nanostructure devices on Ø200 mm wafers. Their versatile capabilities are used to manufacture functional metasurfaces, including metalenses, meta-optical elements (MOE), diffractive optical elements (DOE), patterned nanostructures, waveguides, photonic crystals, and biosensor arrays. These devices are used in imaging, illumination, and display systems for a wide range of applications, including automotive, medical and dental imaging, camera systems, and many others.

‍

Foundry Services

Moxtek collaborates with customers to design, verify, and create solutions for high-volume manufacturing. They provide options for prompt design iterations and NanoImprint Lithography (NIL) optimization. Moxtek uses Statistical Process Control (SPC) monitoring of post-print Critical Dimension (CD) repeatability.

Moxtek offers prototyping samples through their recurring Design Master Shuttle. This NIL Design Master Shuttle includes space for multiple (different) design structures, allowing engineers to test several designs on a single shuttle iteration, thereby reducing development time and cost. They can add a customer’s unique design to their next Design Master Shuttle for prototyping the latest lens or nanostructure optical device. These design shuttles are processed multiple times each year.

Moxtek has been producing nanostructured optical components for over 20 years. They offer high-volume wafer replication of nanostructure devices on Ø200 mm wafers. Their versatile capabilities are used to manufacture functional metasurfaces, including metalenses, meta-optical elements (MOE), diffractive optical elements (DOE), patterned nanostructures, waveguides, photonic crystals, and biosensor arrays. These devices are used in imaging, illumination, and display systems for a wide range of applications, including automotive, medical and dental imaging, camera systems, and many others.

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Benefits

Moxtek wire grid polarizers provide exceptional optical performance across a wide range of conditions.

• Uniform Transmission & Reflection
• High Transmission, High Contrast
• Wavelength Independent
• Wide Angle of Incidence
• High Temperature Durability

‍

Benefits

Moxtek wire grid polarizers provide exceptional optical performance across a wide range of conditions.

• Uniform Transmission & Reflection
• High Transmission, High Contrast
• Wavelength Independent
• Wide Angle of Incidence
• High Temperature Durability

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